OPEN ACCESS
ISSN: 3048-5193
Physical (laser ablation, sputtering, ion implantation) and chemical (CVD, EPD, sol- gel) deposition techniques weave the intricate landscape of thin film formation. The interplay between process parameters and the resulting coating's morphology, microstructure, and functionality is emphasized. This in-depth understanding empowers researchers to tailor deposition strategies for precise manipulation of material properties at the atomic level, ultimately enabling the realization of next-generation coatings with advanced functionalities.