Journal of Coating Technology and Innovation

ABSTRACT

High Power Impulse Magnetron Sputtering (HiPIMS) is a method of Physical vapor deposition (PVD) that allows for the fabrication of high-quality thin films and provides improved control over the deposition process. HiPIMS accomplishes increased ionization levels within the target material by providing high peak power pulses at low duty cycles and frequencies to the sputtering target. This results in dense plasma and intense ion bombardment onto substrates. This produces coatings that are perfect for a variety of uses, including electronics, optics, and tool coatings, with the appropriate density, hardness, and surface defects. Although HiPIMS first appeared in the late 1960s, it gained popularity at the turn of the millennium and has since seen significant academic and commercial uses. HiPIMS has several drawbacks over traditional sputtering techniques, such as substrate restrictions, difficulties with process optimization, and greater setup costs; however, these are outweighed by its benefits over conventional sputtering methods in terms of film quality, productivity, and material properties, which make HiPIMS an invaluable tool for sophisticated thin-film deposition applications. HiPIMS has the potential to generate cutting-edge materials and satisfy the demands of upcoming industrial revolutions.

Article History

KEYWORDS

1. Plasma density
2. Substrate restrictions
3. Productivity
4. HiPIMS